Comparison ledger
EV Group 101, Nikon NSR 2205 i 12 D i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | Can produce wafer as-is |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1996 Vintage · 1999 Vintage |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon NSR 2205 |
| Specifications | ||
| OEM | EV Group[1] | Nikon[5] |
| Model | 101[1] | NSR 2205 i 12 D[5] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Software Version | — | MCSV 2.41, OCSV 2.41[4] |
| CIM | — | SECS[4] |
| Process | — | Photolithography[4] |
| Factory Interface | — | Open Cassette (2)[4] |
| Configuration | — | Vax Station, Pin Chuck[4] |
| Handler Sytem | — | WL Type 3[4] |
| Power | — | 674mW/cm2 (at most recent lamp change in May 2025)[4] |
| Uniformity | — | 0.93% (at most recent lamp change in May 2025)[4] |
| TFD | — | 0.332um (July 2025)[4] |
| Astigmatism | — | 0.259um (July 2025)[4] |
| Tool type | — | i-Line Stepper[5] |
| Wafer size | — | 6 inch[5] |
| Controller/chuck | — | Vax Station, Pin Chuck[4] |
| Handler system | — | WL Type 3[4] |
| Category | — | i-line Stepper[4] |
| Wafer Sizes | — | 6 inch, 8 inch[5] |
| Vintage | — | 1996, 1999[4] |
| Equipment type | — | i-Line Stepper[5] |
| Vax station | — | Pin Chuck[4] |
| Voltage | — | 208 V[7] |
| Phase | — | 3 Phase[7] |
| Handler options | — | SIC Substrate[7] |
| System SW (OS) Version | — | Nikon Nest[7] |
| Robot Type | — | OEM[7] |
| End Effecter Type | — | OEM[7] |
| Supporting Equipment | — | STD OEM items[7] |
| CDA | — | N2[7] |
| DIW | — | Chilled Water[7] |
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