Comparison ledger
CEE 100, Nikon NSR 2005 i 9 C i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100CEE | |
|---|---|---|
| OEM | CEE | Nikon |
| Category | Lithography | Lithography |
| Wafer size | 6" | Standard PDP 11/93 Computer & Silicon Carbide Wafer Loader Type 1 Conversion on it |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | CEE 100 | Nikon NSR 2005 |
| Cited variants |
| — |
| Specifications | ||
| Tool type | Spray Developer[1] | — |
| Accepts wafer size | up to 6" wafers[2] | — |
| Programmable programs | 10 programs[2] | — |
| Steps per program | up to 10 steps[2] | — |
| Programmable step parameters | Acceleration, Speed, Time[2] | — |
| Associated document | CEE Model 100CB Spinner.doc[2] | — |
| Wafer size | Up to 6 inches[2] | Standard PDP 11/93 Computer & Silicon Carbide Wafer Loader Type 1 Conversion on it[3] |
| Programs | 10 programs each with up to 10 steps[2] | — |
| Control parameters | Acceleration, Speed, Time[2] | — |
| Configuration | — | HDD & Software included[3] |
| Reticle | — | 6", normal thickness[5] |
| Wafer | — | 8", OF direction 0*, Ring type wafer[5] |
| Lens type | — | 5iB3[5] |
| Magnification | — | 1/5[5] |
| Field size | — | 21.2 x 25.2mm[5] |
| Lamp power | — | 1750 KW[5] |
| Light source | — | Mercury lamp[5] |
| Reticle Alignment | — | i-line, CCD imagining[5] |
| Make | — | Nikon[3] |
| Model | — | NSR 2005 i 9 C[3] |
| Reticle Size | — | 6 inch[3] |
| Numerical Aperture (NA) | — | 0.57 (selectable <0.57 >0.57)[7] |
| Exposure Light | — | i-line[7] |
| Sigma | — | 0.56 – 0.80[7] |
| Alignment Light | — | HeNe Laser, Halogen Lamp[7] |
| Alignment Method | — | CCD imaging + image processing[7] |
| Alignment Mode | — | LSA (HeNe laser) or FIA (halogen lamp)[7] |
| XY Stage Drive Method | — | Ball screw drive & two-axis interferometer[7] |
| XY Stage Stroke X | — | −115 mm to +150 mm[7] |
| XY Stage Stroke Y | — | −160 mm to +115 mm[7] |
| Auto Focus Method | — | Halogen lamp + AF line sensor[7] |
| Wafer Leveling | — | Two-axis ball screw drive[7] |
| Chamber Set Temperature | — | 23 °C[7] |
| Camera Type | — | CCD[7] |
| Power Supply | — | 208 V, 3 Phase[6] |
| CE Mark Certified | — | Yes[6] |
| Handler Type | — | Prealign II[6] |
| Power | — | 208 V, 3 Phase[6] |
| Manuals Included | — | Partial[6] |
| # of Cassette / FOUP Loaders | — | Cassette Stage[6] |
| Robot Type | — | OEM[6] |
| End Effecter Type | — | OEM[6] |
| Handler Options | — | SiC Substrate[6] |
| System SW (OS) Version | — | Nikon Nest[6] |
| Supporting Equipment | — | STD OEM Items[6] |
| CDA | — | N2[6] |
| DIW | — | Chilled Water[6] |
| PC Model | — | Present (original PC type)[7] |
| Hard Disk | — | Original[7] |
| NEST Upgrade | — | Version: NEST-2[7] |
| Wafer Size (6 inch) | — | 6 inch[6] |
| Wafer Size (8 inch) | — | 8 inch[5] |
| Numerical Aperture | — | 0.57 (range <0.57 >0.57 selectable)[7] |
| Sigma Range | — | 0.56 – 0.80[7] |
| Wafer Alignment Methods | — | LSA (HeNe laser), FIA (halogen lamp)[7] |
| Chamber Temperature Set | — | 23 °C[7] |
| Camera / Vision | — | CCD Type[7] |
| Computer (some units) | — | Standard PDP 11/93[3] |
| Wafer Loader (some units) | — | Silicon Carbide Wafer Loader Type 1 Conversion[3] |
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