Canon

FPA 3000 i 5 + Fine Pattern alternatives

LinkedIn X Email

Comparable Lithography equipment documented in the Waferpedia catalog.

Canon FPA 3000 i 5 + Fine Pattern entry →All Lithography tools →

6 comparable tools

SUSS MicroTec
MA 200 Mask
Lithography
The SUSS MA 200 is a semi-automatic mask aligner capable of processing wafers up to 8 inches in diameter, using UV400 optics and a 365/405 nm sensor.
SUSS MicroTec
MA 6 Mask
Lithography
The SUSS MA 6 Mask Aligner is a semiconductor lithography tool used for mask alignment and exposure, supporting various wafer sizes and featuring infrared alignment and a split-field microscope.
SUSS MicroTec
MJB 4 Mask
Lithography
The SUSS MJB 4 Mask Aligner is a mask aligner used for contact exposure and alignment, with source-stated support for wafers up to 4 inches in diameter.
Brooks
017-0024-01 Prealigner
Lithography
Brooks
017-0146-01 Prealigner
Lithography
Brooks 017-0146-01 is a prealigner manufactured by Brooks.
Ultratech
1000 Family
Lithography

Compare interactively

Need a side-by-side spec table? Open the compare tool to pick any two models.

Compare FPA 3000 i 5 + Fine Pattern with another model →