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InSight 3 DAFM Photomask Atomic Forceversus.204 PSL Wafer

Bruker InSight 3 DAFM Photomask Atomic Force, KLA .204 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrukerKLA
CategoryMetrology & InspectionMetrology & Inspection
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBruker InSight 3 DAFM Photomask Atomic ForceKLA .204 PSL Wafer
Specifications
ConfigurationCD performance:[1]NIST Traceable[3]
Static accuracy3σ (%) < 1.1%[1]—
Dynamic accuracy1.2nm (3σ)[1]—
Throughput (9 sites)14 wph[1]—
Max scan size49X49μm[1]—
Noise0.1nm RMS[1]—
Phase1 Phase[2]—
CD Static Accuracy (3σ)< 1.1%[1]—
CD Dynamic Accuracy (3σ)1.2 nm[1]—
Minimum Pattern Spacing (CD, dense)40 nm[1]—
Depth Static Accuracy (3σ)< 0.4%[1]—
Depth Dynamic Accuracy (3σ)0.5 nm[1]—
Minimum Pattern Spacing (Depth, dense)30 nm[1]—
Maximum Scan Size49×49 μm[1]—
Power Phase1 Phase[2]—
Power Wire3 Wire[2]—
Power Frequency50/60 Hz[2]—
Power Voltage208-230 V[2]—
Peak kVA2.8[2]—
Average kVA2.0[2]—
Wafer Size—8 inch[3]
Traceability—NIST[4]
Compatible Tools—Surfscan 6xy0, Sp1[3]
NIST Traceable—Yes[3]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]inventory listing
  4. [4]waferpedia.comwaferpedia.com