Comparison ledger
Axcelis 200 ACU, Pfeiffer Alcatel 601 E DRIE, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 200 ACUAxcelis | Alcatel 601 E DRIEPfeiffer |
|---|---|---|
| OEM | Axcelis | Pfeiffer |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Axcelis NV GSD 200 | Pfeiffer Alcatel |
| Specifications | ||
| Configuration | Parts Machine[1] | With:[5] |
| Manufacturer | Axcelis[1] | — |
| Model | 200 ACU[1] | 601 E[5] |
| Tool type | Asher[1] | — |
| Wafer size | 200mm[3] | — |
| Serial number | AU6A356AH[3] | — |
| Computer system | M 200 PC, M 200[4] | — |
| Part number | SC 4572 A[4] | — |
| Volts | 208[4] | — |
| Amps | 30[4] | — |
| Equipment type | Asher[1] | — |
| Wafer configuration | 8 inch[2] | — |
| Type | — | Deep Reactive Ion Etch system[6] |
| Category | — | Etch[6] |
| Make | — | Pfeiffer / Alcatel[5] |
| Power | — | Advanced Energy RF-F2[6] |
| Vacuum | — | VAT Adaptive Pressure Controller[6] |
| Configuration / options | — | Alcatel ACT 1300 M[5] |
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