Waferpedia

Comparison ledger

Centura I DPS Polyversus200 ACU

Applied Materials Centura I DPS Poly, Axcelis 200 ACU, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
Centura I DPS PolyApplied Materials
200 ACUAxcelis
OEMApplied MaterialsAxcelis
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials CenturaAxcelis NV GSD 200
Specifications
Configuration2x DPS Poly Chambers[1]Parts Machine[2]
Phase3 Phase[1]—
Voltage208 Vac[1]—
Wafer Size8 inch[1]—
Chambers2x DPS Poly Chambers[1]—
RF GeneratorsAdvanced Energy RF 5S and RF 20 RWC 2000[1]—
Power3 Phase, 4 Wire, 208 Vac, 50/60 Hz[1]—
Manufacturer—Axcelis[2]
Model—200 ACU[2]
Tool type—Asher[2]
Wafer size—200mm[4]
Serial number—AU6A356AH[4]
Computer system—M 200 PC, M 200[5]
Part number—SC 4572 A[5]
Volts—208[5]
Amps—30[5]
Equipment type—Asher[2]
Wafer configuration—8 inch[3]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]wotol.comwotol.com
  5. [5]semistarcorp.comsemistarcorp.com