Waferpedia

Comparison ledger

0010-16392 ESC Assemblyversus590

Applied Materials 0010-16392 ESC Assembly, Lam Research 590, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-16392 ESC AssemblyApplied Materials
590Lam Research
OEMApplied MaterialsLam Research
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-16392 ESC AssemblyLam Research 590
Specifications
OEMApplied Materials[1]Lam Research[3]
Model0010-16392[1]590[3]
TypeESC Assembly[1]—
Wafer Size300 mm[2]—
Electrode ConfigurationDual[2]—
Voltage—208V[3]
Wafer size—6 inch[3]
RF frequency—13.56 MHz[5]
Pressure—2.8 Torr[5]
Gap—0.38 cm[5]
Power (low)—450 W[5]
Power (high)—850 W[5]
Category—Etcher[3]
Power—208V[3]
Plasma recipe entry—CF4+CHF3+He (90:30:120 sccm)[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]spwindustrial.comspwindustrial.com
  3. [3]inventory listing
  4. [4]inventory listing
  5. [5]nanocenter.umd.edunanocenter.umd.edu