Comparison ledger
Tokyo Electron Tactras RLSA, Tokyo Electron Tactras RLSA Process, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Tactras RLSATokyo Electron | Tactras RLSA ProcessTokyo Electron |
|---|---|---|
| OEM | Tokyo Electron | Tokyo Electron |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Tactras RLSA | Tokyo Electron Tactras RLSA |
| Specifications | ||
| Configuration | Oxide, Nitride, Polysilicon[1] | Poly Etch[5] |
| Chamber Type | Polysilicon Dry Etch Chamber[2] | — |
| Wafer Size | 300mm[3] | — |
| Microwave Generator | Nihon Koshuha Microwave Generator, Model MKS 050B04C-OSC-V[4] | — |
| Turbo Pump | SHIMADZU FT2301D[4] | — |
| Top Generator | MKS-050B04 PS-V[4] | — |
| Bottom Generator | Daihen RGA-20C[4] | — |
| Gas Box Configuration | N2, TSA, Ar, H2, NF3, SiH4[4] | — |
| Chuck | ESC with Dual He Cooling[4] | — |
| Manufacturer | — | Tokyo Electron (Tel)[7] |
| Model | — | Tactras RLSA[7] |
| Wafer size | — | 12 inch[5] |
| Process application | — | Poly etch[7] |
| Category | — | Etch[7] |
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