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Comparison ledger

5200 Diffusionversus0332 F 9453 302 Diffusion

Thermco 5200 Diffusion, Varian 0332 F 9453 302 Diffusion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMThermcoVarian
CategoryThermal / DiffusionThermal / Diffusion
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyThermco 5200 DiffusionVarian 0332 F 9453 302 Diffusion
Specifications
ConfigurationBoron[1]—
MakeThermco[2]—
Model5200[2]—
Wafer size6 inch[2]—
Process chambersTwo to four-process chamber systems[3]—
Substrate diameterUp to 150 mm[3]—
ApplicationsSemiconductor, PV, LED, Nano, and MEMS substrates[3]—
Control systemThermco TMX controller[3]—
Heating zones3 independently controlled heating zones[3]—
Operating temperature range200°C to 1350°C[3]—
Flatzone1,100 mm[3]—
Asset Number—142841[4]
Last Confirm Date—October 14, 2025[5]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]thermcosystems.comthermcosystems.com
  4. [4]Equipment inventory listing
  5. [5]fab-spares.comfab-spares.com