Comparison ledger
SUSS MicroTec MJB 3 350 W Mask, Ultratech 1000 Family, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | MJB 3 350 W MaskSUSS MicroTec | 1000 FamilyUltratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | Wafer Equipment | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec MJB3 350W Mask | Ultratech 1000 Family |
| Specifications | ||
| Wafer size | Wafer Equipment[1] | — |
| - Model | MJB3 Main System[1] | — |
| - Manufacturer | Suss MicroTec / Karl Suss[1] | — |
| - Max Wafer Size | 3" Diameter[1] | — |
| - Eyepieces | 10x[1] | — |
| - Objectives | 3.5x and 10x[1] | — |
| - Exposure Mode | Vacuum Contact, Hard & Soft[1] | — |
| - Exposure Resolution | 0.8 Microns (under optimum conditions)[1] | — |
| - Alignment Resolution | 0.25um (operator dependant)[1] | — |
| Wafer Sizes | 3 inch[2] | — |
| Tool type | — | Photolithography step-and-repeat 1X stepper[3] |
| Optical design | — | Wynne Dyson[3] |
| Magnification | — | 1X[3] |
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