Comparison ledger
SUSS MicroTec 150 e Mask, Ultratech XLS 7800, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | XLS 7800Ultratech |
|---|---|---|
| OEM | SUSS MicroTec | Ultratech |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | SUSS MicroTec 150 e Mask | Ultratech XLS 7800 |
| Specifications | ||
| Manufacturer | — | Ultratech[1] |
| Model | — | XLS 7800[1] |
| Wafer sizes | — | 6 inch[1] |
| Wafer diameter(s) | — | 200 mm[2] |
| Wafer holder | — | ceramic vacuum chuck[2] |
| Wafer materials | — | silicon[2] |
| Wafer thickness | — | 700 .. 750 µm[2] |
| Laser source | — | 248nm[3] |
| Optical reduction | — | 4X reduction[3] |
| Field size | — | full field (22 squared mm)[3] |
| NA | — | 0.51[3] |
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