Comparison ledger
Oxford Instruments 800 Plus RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 800 Plus RIEOxford Instruments | 1512eTegal |
|---|---|---|
| OEM | Oxford Instruments | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments Plasmalab 800 | Tegal 1512e |
| Specifications | ||
| Configuration | may have missing parts[1] | — |
| Process type | Reactive I on Etching (RIE)[2] | — |
| Wafer size | 5 inch[1] | — |
| Control system | PC controller[2] | — |
| Footprint | All electronics and vacuum components located within tool body to minimize footprint[2] | — |
| RF supply | Advanced Energy RFX 600A[2] | — |
| Tur bpump | Leybold TMP-361C[2] | — |
| Tur bpump controller | Leybold Harris Turbotronik NT20[2] | — |
| Vacuum pump | Busch Cobra BA100[2] | — |
| Elecrical supply | 208 VAC, 3 Phase[3] | — |
| Included subsystems | Process chamber, gas-delivery and control enclosure, cooling and shutter controls, pumping/control computer[3] | — |
| Tool type | — | Industrial RIE plasma etcher system[4] |
| Stated configuration | — | With modules assembly for CI-4222[4] |
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