Comparison ledger
Nikon NSR S 204 B, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NSR S 204 BNikon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Nikon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon NSR S 204 | SUSS MicroTec 150 e Mask |
| Cited variants | — | |
| Specifications | ||
| Software Version | MCSV[3] | — |
| CIM | SECS[3] | — |
| Process | Photolithography[3] | — |
| Handler System | WL Type 3[3] | — |
| Factory Interface | Open Cassette[3] | — |
| Configuration | Cymer ELS 6400[1] | — |
| WL Size | 200MM[2] | — |
| Reticle Size | 6"[2] | — |
| RL Type | Standard (no smif)[2] | — |
| NEMA Box | 3P 200V[2] | — |
| Chamber | Sendai[2] | — |
| Lens Type | 4EN2GK[2] | — |
| Chemical Filter | Donaldson[2] | — |
| Online Interface | Tel ACT 8 Slow[2] | — |
| Wafer Size | 8 inch[3] | — |
| Laser | Cymer ELS 6400[1] | — |
| Vintage | 2001[1] | — |
| Variable NA | Yes[2] | — |
| HDD | Included[4] | — |
| Lens Data | Available[4] | — |
| Make | Nikon[3] | — |
| Model | NSR S 204 B[3] | — |
| Wafer Sizes | 8 inch[3] | — |
| Features | Chip (table) Leveling; In-Line Right; Tel Track; FIA; Pellicle Particle Detector; Variable NA; Microscope Theta; Signal Tower I/F; Online Interface: Tel ACT 8 Slow; MCSV; OCSV; GOCS; Bar Code Reader; MES Software; AIS; Signal Lamp Tower; RPF (random pattern filter)[2] | — |
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