Comparison ledger
MPM Momentum II 100, YES 1000FP, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000FPYES | |
|---|---|---|
| OEM | MPM | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | MPM Momentum II 100 | YES 1000FP |
| Specifications | ||
| Configuration | Automatic Stencil Positioning[1] | — |
| Machine type | Stencil printer[2] | — |
| Automatic stencil positioning camera vision | Included[2] | — |
| Automatic stencil-to-board alignment | Included[2] | — |
| Stencil cleaner | UltraWipe stencil cleaner[2] | — |
| Maximum board size | 609.6 mm x 508 mm (24" x 20")[3] | — |
| Print speed | 0.635 mm/s - 304.8 mm/s[3] | — |
| Accuracy and repeatability | Cpk ≥ 2.0[3] | — |
| Wet print deposit | ±17 microns (±0.0007") at 6 sigma[3] | — |
| Alignment repeatability | ±11 microns @ 6 sigma[3] | — |
| Wet print accuracy | 20µm@6σ, Cpk ≥ 2[3] | — |
| Line-length reduction | 200 mm shorter than the standard Momentum II stencil printer platform[3] | — |
| System type | — | Plasma cleaning system[4] |
| Line | — | R-Series Plasma Cleaning Systems (Glen Technologies)[4] |
| Model | — | Glen/YES 1000FP[4] |
| Designed use | — | Designed to accept a range of shelf sizes[4] |
| Application focus | — | Changing needs of the flat panel industry[4] |
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