Comparison ledger
Laurell 750 Series, Laurell EDC-HL-23 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 750 SeriesLaurell | EDC-HL-23 BLaurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | 150mm | 150mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Laurell 750 Series | Laurell EDC-HL-23 B |
| Specifications | ||
| Product type | Spin coater[1] | — |
| Interface | Enhanced touchscreen with intuitive interface[1] | — |
| Process control | Intelligent process control[1] | — |
| Data logging | Data logging[1] | — |
| Manufacturing | Engineered and assembled in the United States[1] | — |
| Type | Spin coater and spin processor[1] | — |
| Available wafer sizes | ø150mm, ø200mm, ø300mm[1] | — |
| OEM | — | Laurell[2] |
| Model | — | EDC-HL-23 B[2] |
| Model Type | — | EDC System[2] |
| Controller | — | 650-series[2] |
| Max. Substrate Size | — | 150 mm (5" x 5")[2] |
| Max. RPM | — | 12000 rpm[2] |
| Mounting Options | — | Tabletop, In-Deck, On-deck[2] |
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