Comparison ledger
Lam Research TCP 9600 SE Metal, Oxford Instruments Plasmalab 100 ICP 380, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | TCP 9600 SE MetalLam Research | Plasmalab 100 ICP 380Oxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research TCP 9600 | Oxford Instruments Plasmalab 100 |
| Specifications | ||
| Install Type | Through-the-wall[2] | — |
| Software Type | Lam Envision[2] | — |
| Software Version | E 1.5.2[2] | — |
| Configuration | SECS Interface[2] | — |
| Electrical Requirements | 208V/80A[2] | — |
| PM 1 / Main Chamber | Metal Etch[2] | — |
| Helium Cooling MFC Type | UNIT UPC8130[2] | — |
| Main On-Board AC Distribution Type | Fused[2] | — |
| DSQ Type | Hinged[2] | — |
| Endpoint Type | Monochromators[2] | — |
| Voltage | 208 V[3] | 415 Vac 3~[1] |
| Wafer Sizes | 6 inch, 8 inch[4] | — |
| SECS Interface | Yes[2] | — |
| Mainframe Type | Stand Alone Etcher Mainframe[2] | — |
| Process Module | PM 1 / Main Chamber: Metal Etch[2] | — |
| Gas Box | Orbitally Welded Gas Box[2] | — |
| Backside Helium Cooling | Yes[2] | — |
| Heated Pumping Manifolds | Yes[2] | — |
| On-Board RF Generators | Yes[2] | — |
| WVDS | Yes[2] | — |
| Indexers | Hine 38A Indexers[2] | — |
| Endpoint Detection System | Yes[2] | — |
| Endpoint Lam PN | 830-330546-001[2] | — |
| Chamber Liner | Yes[2] | — |
| Chamber Anodization Condition | Good[2] | — |
| Electrode Fixed Gap | Yes[2] | — |
| Wafer Clamp Type | ESC (Electrostatic Chuck)[2] | — |
| ESC Type | Polyamid[2] | — |
| Gate Valve Type | Pendulum[2] | — |
| TCP Coil Size | 6"[2] | — |
| Chiller Make/Model | Edwards TCU40/80[2] | — |
| Chiller Electrical Requirements | 200/208VAC / 25A[2] | — |
| Chiller Number of Cooling Channels | One[2] | — |
| Wafer Clamp | ESC[2] | — |
| Gate Valve | Pendulum[2] | — |
| # of Cooling Channels | One[2] | — |
| Gas Panel | Standard[2] | — |
| Chamber Process | Metal Etch (PM 1 / Main Chamber)[2] | — |
| RF Generators | On-Board[2] | — |
| Main AC Distribution Type | Fused[2] | — |
| Electrode Type | Fixed Gap[2] | — |
| Chiller Model | Edwards TCU40/80[2] | — |
| Number of Cooling Channels | One[2] | — |
| Additional Electrical (208 V variant) | 208 V[3] | — |
| OEM | Lam Research[2] | — |
| Model | TCP 9600 SE[2] | — |
| Category | Etch[2] | — |
| Main chamber | Metal Etch[2] | — |
| Chiller | Edwards TCU40/80[2] | — |
| Gas panel | Standard Gas Panel[2] | — |
| Frequency | — | 50 Hz[1] |
| Max rated input current | — | 42 amps[1] |
| Interrupt current | — | 6KA[1] |
| Supply voltage | — | 415 Vac 3~[1] |
| Vintage | — | 2011[1] |
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