Waferpedia

Comparison ledger

4520 XLEversus100 ICP Fluorine

Lam Research 4520 XLE, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
4520 XLELam Research
100 ICP FluorineOxford Instruments
OEMLam ResearchOxford Instruments
CategoryEtchEtch
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyLam Research Rainbow 4520Oxford Instruments 100 ICP Fluorine
Specifications
ConfigurationParts System[1]—
TypeEtcher[2]—
MakeLam[2]—
Wafer size8 inch[2]4 inch, 6 inch, 8 inch (with clamp change)[3]
Listing typeParts System[1]—
Etch Gases—SF6, CF4, O2, Ar, N2, CHF3, C4F8[3]
Cryo DRIE etch rate—up to 5 µm/min[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]Equipment inventory listing
  3. [3]nanofab.utah.edunanofab.utah.edu