Waferpedia

Comparison ledger

P-15versusZ3D-7000

KLA P-15, Zygo Z3D-7000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
P-15KLA
OEMKLAZygo
CategoryMetrology & InspectionMetrology & Inspection
Wafer size200mm200mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation—5th generation
FamilyKLA P-15Zygo Z3D-7000
Specifications
Sample table200 mm sample table with vacuum[1]—
Measurement rangeMeasures steps from 100 Å to 300 µm[1]—
Maximum sample thickness20 mm[1]—
Minimum sample length25 mm[1]—
Tool typeProfilometer[2]—
Measurement capabilitiesMeasures roughness, waviness, step height, and other surface characteristics[3]—
Wafer capabilityUp to 8"/200mm wafer capable[3]—
Control platformWindows NT[3]—
Software versionProfiler v6.41[3]—
AutomationComputer controlled; automatic measurement capability[3]—
Measurement type—Non-contacting, non-destructive optical metrology[4]
Wafer sizes—200 mm and 300 mm wafers[4]
Bridge-tool configuration—Can be configured to simultaneously handle both wafer sizes[4]
Key features—High speed non-contacting metrology; simultaneously measures multiple parameters; ISO Class 2, S2/S8, and CE certified; SEMI E95 compliant software; modular IntelliSensors reduce MTBR[4]
Technology—ZYGO's fifth generation interferometric technology[4]
Software—MetroPro software[4]
Loaded wafers—FOUPS and/or open cassettes[4]
Throughput—Exceeds throughput of contact technologies (profilers, atomic force microscopes) by a factor of 10[4]
Simultaneous measurements—Film thickness, critical dimensions, overlay, trench depth, and general surface topography[4]
Precision—Sub-nanometer precision for critical etch depth processes[4]
Wafer loading—FOUPS and/or open cassettes, pre-alignment, super flat chuck[4]
Certifications—ISO Class 2, S2/S8, CE certified[4]
Software compliance—SEMI E95 compliant[4]
Modular sensors—IntelliSensors reduce MTBR[4]
Algorithms—OneShot, TopSlice, FilmSlice[4]

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Sources (4)Every fact above is drawn from these public sources
  1. [1]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  2. [2]nanofab.ece.cmu.edunanofab.ece.cmu.edu
  3. [3]classoneequipment.comclassoneequipment.com
  4. [4]web.archive.orgweb.archive.org