Waferpedia

Comparison ledger

IQ Maskversus150 e Mask

EV Group IQ Mask, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
IQ MaskEV Group
150 e MaskSUSS MicroTec
OEMEV GroupSUSS MicroTec
CategoryLithographyLithography
Wafer sizeMotorized swivel arm Wafer loading trays required for desired wafer size ic devices.—
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyEV Group IQ MaskSUSS MicroTec 150 e Mask
Specifications
ConfigurationDual end effector robot handling configuration.[1]—
Reinforced stage drivesX/Y/Theta axis Internal wedge compensation unit: Automatic wedge compensation Substrate and mask.[1]—
Power500W or 1000W Hg lamps house Optical sets:[1]—
Wafer sizeMotorized swivel arm Wafer loading trays required for desired wafer size ic devices.[1]—
OEMEV Group[1]—
ModelIQ Mask[1]—
CategoryLithography[2]—
Handling configurationDual end effector robot handling configuration[1]—
Alignment stageMotorized alignment stage with precision guided X, Y, T alignment[1]—
Wedge compensationAutomatic wedge compensation[1]—
Optics / lamps500W or 1000W Hg lamps house optical sets[1]—
MicroscopeFully motorized split field microscope with high resolution CCD camera[1]—
Bottom side microscopeFully motorized split field microscope for bottom side viewing with high resolution CCD camera[1]—
ControlComplete computer control for operator interface and alignment functions[1]—

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com
  3. [3]waferpedia.comwaferpedia.com