Comparison ledger
EV Group EV-420, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EV-420EV Group | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | EV Group | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group EV-420 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Equipment type | front & backside mask aligner[1] | — |
| Type | Front & backside mask aligner[2] | — |
| Exposure source | UV[3] | — |
| Exposure dose (as stated) | 625 mJ/cm²[3] | — |
| UV source intensity | 625 mJ/cm² (measured during exposure)[3] | — |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →