Comparison ledger
EV Group 101, Nikon NSR 2005 i 11 D i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 101EV Group | |
|---|---|---|
| OEM | EV Group | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | Wafer Loader |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | EV Group 101 | Nikon NSR 2005 |
| Specifications | ||
| OEM | EV Group[1] | — |
| Model | 101[1] | NSR 2005 i 11 D[5] |
| Equipment name | EVG 101 Spray Coater[1] | — |
| NEMO ID | evgspraycoat[1] | — |
| Training required | EVG 101 Training[1] | — |
| Training duration | 1.50 hours[1] | — |
| Processing technique | Resist Spray Coat (manual)[1] | — |
| Cleanliness | "All"[1] | — |
| Location | SNF Paul G Allen L107 Cleanroom[1] | — |
| Wafer diameter (substrate size) | up to 300 mm[2] | — |
| Available modules | Spin coat / OmniSpray® / develop[2] | — |
| Wafer handling options | Bowed / warped / thin wafer handling, edge handling[2] | — |
| Dispense options | Various resist dispense pumps covering viscosities up to 52000 cP; constant pressure dispense systems; EBR / BSR / pre-wet / bowl wash / liquid priming[2] | — |
| Processing technique (at SNF) | Resist Spray Coat (manual)[3] | — |
| Cleanliness group (at SNF) | "All"[1] | — |
| Illumination WL | — | i-line[4] |
| Illumination uniformity | — | 2.00%[4] |
| CD unifotmity | — | 400nm[4] |
| Overlay (single machine) | — | 70nm[4] |
| Reticle size | — | 5"[4] |
| Lens reduction | — | 1/5[4] |
| Control System | — | VAX Station[5] |
| Configuration | — | Modules:[6] |
| Wafer size | — | Wafer Loader[5] |
| AC Power Distribution System | — | Electricity Box[6] |
| Manufacturer | — | Nikon[5] |
| Category | — | Lithography[5] |
| CD uniformity | — | 400nm[4] |
| Modules | — | Operation Panel; Retical Loader; Wafer Loader; Lens Controller; AC Power Distribution System: Electricity Box[6] |
| Vintage | — | 1996[4] |
Plan your fab
Building a Lithography process? Get a complete equipment list.
Open the fab equipment planner →