Comparison ledger
Canon FPA 6000 ES 6 a, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | FPA 6000 ES 6 aCanon | 150 e MaskSUSS MicroTec |
|---|---|---|
| OEM | Canon | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Canon FPA 6000 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 248nm (KrF)[1] | — |
| Manufacturer | Canon[2] | — |
| Model | FPA 6000 ES 6 a[1] | — |
| Wafer size | 12 inch[1] | — |
| Exposure wavelength | 248nm (KrF)[2] | — |
| Process | DUV (248nm) KRF[3] | — |
| Category | Lithography[2] | — |
| Tool type | lithography scanner[2] | — |
| Numerical aperture (NA) | 0.55 ~ 0.86[4] | — |
| Resolution | 0.09µm[4] | — |
| Reticle size | 6in. (0.25in. thick)[4] | — |
| Reduction ratio | 4:1[4] | — |
| Field size | 26mm x 33mm[4] | — |
| Overlay accuracy | ≤8nm (M+3)[4] | — |
| Throughput | ≥100wph (300mm, 122shots); ≥170wph (200mm, 58shots)[4] | — |
| Scanner vintage | 2005[3] | — |
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