Waferpedia

Comparison ledger

017-0146-01 PrealignerversusSE600

Brooks 017-0146-01 Prealigner, CHA SE600, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMBrooksCHA
CategoryLithographyLithography
Wafer size—300mm
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyBrooks 017-0146-01 PrealignerCHA SE600
Specifications
Tool type—Electron Beam Lithography System[1]
Substrate range—10 mm pieces up to 300 mm wafers[1]
Minimum feature size—less than 10 nm[1]
Equipment type—Electron beam evaporator[2]
Alternate description—Gold evaporator[3]
Manufacturer—CHA[2]
Part number—SE600[3]
Unit vintage date—01.06.1980[2]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]cnf.cornell.educnf.cornell.edu
  2. [2]fabsurplus.comfabsurplus.com
  3. [3]semi-sps.comsemi-sps.com