Comparison ledger
ASML Twinscan 1950 i Immersion, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML Twinscan | SUSS MicroTec 150 e Mask |
| Specifications | ||
| Configuration | 2 Scara Arm[1] | — |
| Model | Twinscan 1950 i[2] | — |
| OEM | ASML[2] | — |
| Type | Immersion Scanner[2] | — |
| Reticle Handler | 1RH IRL IRIS[2] | — |
| Reticle Carriers | 2[2] | — |
| Scara Arms | 2[2] | — |
| Smash OM | 1[2] | — |
| Light Source | Cymer XLR 560[2] | — |
| Light Source Vintage | 2010[2] | — |
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