Comparison ledger
ASML PAS 5500 300 C Wafer, SUSS MicroTec 150 e Mask, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 150 e MaskSUSS MicroTec | |
|---|---|---|
| OEM | ASML | SUSS MicroTec |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ASML PAS 5500 | SUSS MicroTec 150 e Mask |
| Specifications | ||
| SW version | 8.9.0.c[1] | — |
| PC (Sun) | Netra[1] | — |
| Chuck Type | SiC (LC)[1] | — |
| Light source (Cymer Laser) | 5600 KrF[1] | — |
| CLEAR (auto chuck cleaning) | N/A[1] | — |
| STARTSMART (overlay improvement) | N/A[1] | — |
| DoseMapper (CD improvement) | NO[1] | — |
| CPE (Correction per exposure) | NO[1] | — |
| Configuration | Test Streaming (Cycle time improvement, test queue insertion into batch streaming): auditing[1] | — |
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