Comparison ledger
Applied Materials Centura eMax Nitride, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Centura eMax NitrideApplied Materials | 1512eTegal |
|---|---|---|
| OEM | Applied Materials | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials Centura | Tegal 1512e |
| Specifications | ||
| Configuration | 2 Chamber Emax[1] | — |
| Gas | CF4, CH2F2, CHF3, Ar, O2, N2[1] | — |
| OS | AMAT Legacy[1] | — |
| Buffer Robot | HP[1] | — |
| Chiller 1 | AMAT Endura HX 18706-01[1] | — |
| Chiller 2 | Thermo Electron HX 150 106178026[1] | — |
| Wafer size | 8 inch[1] | — |
| Chamber configuration | 2 Chamber Emax; 1 Orienter/degas[1] | — |
| Gas chemistry | CF4, CH2F2, CHF3, Ar, O2, N2[1] | — |
| Operating system | AMAT Legacy[1] | — |
| Chamber #A | eMAX[1] | — |
| Chamber #B | eMAX[1] | — |
| Chamber #C | EMPTY[1] | — |
| Chamber #D | EMPTY[1] | — |
| Chamber #E | EMPTY[1] | — |
| Chamber #F | Orienter[1] | — |
| Tool type | — | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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