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Comparison ledger

0020 17485 PartversusCentura 5200 Metal

Applied Materials 0020 17485 Part, Applied Materials Centura 5200 Metal, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0020 17485 PartApplied Materials
Centura 5200 MetalApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0020 17485 PartApplied Materials Centura 5200
Specifications
ConfigurationStrap, RF Out 2 Balanced Coil Match, Hdp[1]Ti/TiN MCVD[2]
Process—CVD (Chemical Vapor Deposition)[2]
Wafer size—8 inch[2]
Process chambers—Chamber A – MCVD TiN; Chamber B – MCVD TiN; Chamber C – MCVD Ti; Chamber D – MCVD Ti[2]
Ti/TiN MCVD—1[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]inventory listing
  3. [3]waferpedia.comwaferpedia.com