Comparison ledger
Applied Materials 0010 47763, Lam Research Alliance 6 9400 PTX, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010 47763Applied Materials | Alliance 6 9400 PTXLam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010 47763 | Lam Research Alliance |
| Specifications | ||
| Configuration | 2nd Source New[1] | 3 Chamber[4] |
| Type | Monopolar Dual Heated[2] | — |
| Description | ASSY, ESC, BONDED, MONOPOLAR DUAL HEATED[3] | — |
| Possible Materials | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Model | 0010-47763[1] | — |
| OEM | Applied Materials[1] | — |
| Material (possible) | Al2O3 (aluminum oxide) or AlN (aluminum nitride)[2] | — |
| Application | Fixing wafers in etching process (PVD, CVD, ETCH)[2] | — |
| Quantity available (source) | 1[2] | — |
| Voltage | — | 208 VAC[5] |
| Full Load Current | — | 43 Amps[5] |
| Capacity of Main Breaker | — | 10 kA[5] |
| Wafer Size | — | 8 inch[4] |
| Number of Chambers | — | 3 Chamber[4] |
| Frequency | — | 50/60 Hz[5] |
| Operating System | — | Upgraded to Windows 7[5] |
| Endpoint Detection | — | OES (Optical Emission Spectroscopy)[5] |
| Chamber Type | — | Poly Etch Chambers[5] |
| Number of Poly Etch Chambers | — | All 3[5] |
| Vintage | — | 2000[5] |
| Asset # | — | 132832[6] |
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