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0010-13622 RF Match forversusCentura

Applied Materials 0010-13622 RF Match for, Applied Materials Centura, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-13622 RF Match forApplied Materials
CenturaApplied Materials
OEMApplied MaterialsApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-13622 RF Match forApplied Materials Centura
Cited variants—
  • Ultima+ HDP[1]
  • 3 C/H, DxZ[2]
  • SIGEN 4CH[3]
  • Centura CVD (Chemical Vapor Deposition)[1]
  • Centura Etcher[4]
  • Centura CVD Ultima+ HDP[1]
  • Centura CVD DxZ[2]
  • Centura Etcher EMAX CT Plus[4]
  • Centura CVD SIGEN 4CH[3]
Specifications
ConfigurationHigh Efficiency HE RF Match-Bias[5]Ultima+ HDP[1]
Model0010-13622[5]Centura[1]
Product TypeRF Match for PVD (Physical Vapor Deposition)[5]—
FeatureHigh Efficiency HE RF Match-Bias[5]—
OEM—Applied Materials[1]
Process type—Chemical vapor deposition (CVD)[1]
Wafer size—8 inch[1]
Variant—Ultima+ HDP (8-inch CVD)[1]
Equipment type—CVD (Chemical Vapor Deposition)[1]
Product details—8" Ultima+ HDP 2002 Vintage[1]

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Sources (5)Every fact above is drawn from these public sources
  1. [1]Equipment inventory listing
  2. [2]Equipment inventory listing
  3. [3]Equipment inventory listing
  4. [4]Equipment inventory listing
  5. [5]inventory listing