Comparison ledger
Applied Materials 0010-03485 Magnet Assy, Lam Research Gasonics Aura 2000, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 0010-03485 Magnet AssyApplied Materials | Gasonics Aura 2000Lam Research |
|---|---|---|
| OEM | Applied Materials | Lam Research |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Applied Materials 0010-03485 Magnet Assy | Lam Research Gasonics Aura |
| Specifications | ||
| Configuration | WP AL 300mm PVD[1] | — |
| OEM | Applied Materials[1] | — |
| Model | 0010-03485[1] | Aura 2000[6] |
| Description | MAGNET ASSY, WP AL 300MM PVD[2] | — |
| Process | PVD[3] | — |
| Wafer size | 300mm[4] | — |
| Version | Spares[4] | — |
| Part Number | 0010-03485[1] | — |
| Manufacturer | Applied Materials[1] | Lam Research[5] |
| Process Type | PVD (Physical Vapor Deposition)[1] | — |
| Application (Material) | Aluminum (AL)[1] | — |
| Wafer Diameter (associated) | 300 mm[1] | — |
| Phase | — | 3 Phase[5] |
| Frequency | — | 50 Hz[5] |
| Voltage | — | 208V[5] |
| Make | — | Lam / Novellus / Gasonics[6] |
| Category | — | Plasma Asher Descum[7] |
| Pressure | — | 0.5 – >5.0 torr[7] |
| Platen temperature | — | 150 – 300°C[7] |
| Microwave power | — | 0 – 1000 watts at 2.45 GHz[7] |
| Lamp utilization | — | 0 – 100% (1000 watts)[7] |
| Throughput | — | 45-60 wph[7] |
| Asher rate | — | 1.5u-5u/min. positive photoresist; >8u/min. negative photoresist[7] |
| Uniformity | — | 15%, process dependent[7] |
| Particulate | — | <0.05 /cm2 (0.03um or greater)[7] |
| Damage | — | CV: <0.I V CV-shift for 250A gate oxide[7] |
| Selectivity | — | >1000:1[7] |