Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusCDX 2000

Applied Materials 0010-03485 Magnet Assy, Comdel CDX 2000, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
CDX 2000Comdel
OEMApplied MaterialsComdel
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet Assy—
Specifications
ConfigurationWP AL 300mm PVD[1]—
OEMApplied Materials[1]—
Model0010-03485[1]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[2]—
ProcessPVD[3]—
Wafer size300mm[4]—
VersionSpares[4]—
Part Number0010-03485[1]—
ManufacturerApplied Materials[1]—
Process TypePVD (Physical Vapor Deposition)[1]—
Application (Material)Aluminum (AL)[1]—
Wafer Diameter (associated)300 mm[1]—
Output frequency (HF)—13.56 MHz (optional 2-60 MHz)[5]
Output frequency (LF)—400 kHz (optional 20-450 kHz)[5]
Output power (HF)—0-1000 W continuous forward power[5]
Output power (LF)—0-1000 W continuous forward power[5]
Input voltage—208 VAC three phase (187-229 V range)[5]
Operating temperature—+10 to +40 °C ambient[5]
Storage temperature—-25 to +70 °C[5]
Dry weight (max)—61.4 kg (135 lb)[5]
Linearity—+/- 3.0% deviation from 10% to 100% max output[5]
Rack mounting—Standard 19-inch EIA rack[5]
RF output connector—Type "N" female coaxial bulkhead[5]
Sources (5)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]semistarcorp.comsemistarcorp.com
  3. [3]layla-ec.comlayla-ec.com
  4. [4]fabsurplus.comfabsurplus.com
  5. [5]manualslib.commanualslib.com