Waferpedia

Comparison ledger

0010-03485 Magnet AssyversusEKD-13J

Applied Materials 0010-03485 Magnet Assy, Brooks EKD-13J, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03485 Magnet AssyApplied Materials
EKD-13JBrooks
OEMApplied MaterialsBrooks
Category——
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyApplied Materials 0010-03485 Magnet AssyBrooks EKD-13J
Cited variants—
Specifications
ConfigurationWP AL 300mm PVD[2]—
OEMApplied Materials[2]—
Model0010-03485[2]—
DescriptionMAGNET ASSY, WP AL 300MM PVD[3]—
ProcessPVD[4]—
Wafer size300mm[5]—
VersionSpares[5]—
Part Number0010-03485[2]—
ManufacturerApplied Materials[2]—
Process TypePVD (Physical Vapor Deposition)[2]—
Application (Material)Aluminum (AL)[2]—
Wafer Diameter (associated)300 mm[2]—
Profile—Deep[1]
Depth—5.25 inch[1]
Meter Forms—6/8/9/10S[1]
Series—EKD Series (Meter Interbase Adapter)[1]
Profile depth—Deep Profile, 5.25 inch depth[1]
Shell construction—One-piece injection molded polycarbonate shell with clear polycarbonate dead-front safety shield to prevent contact with live components[1]
Design purpose—Designed for applications requiring extra space to accommodate additional capability, allowing the inclusion of more active components and devices[1]
Sources (5)Every fact above is drawn from these public sources
  1. [1]brooksutility.combrooksutility.com
  2. [2]inventory listing
  3. [3]semistarcorp.comsemistarcorp.com
  4. [4]layla-ec.comlayla-ec.com
  5. [5]fabsurplus.comfabsurplus.com