Waferpedia

Comparison ledger

0010-03254 E ChuckversusUVision 3

Applied Materials 0010-03254 E Chuck, Applied Materials UVision 3, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
0010-03254 E ChuckApplied Materials
UVision 3Applied Materials
OEMApplied MaterialsApplied Materials
Category——
Wafer size——
Process node——
Introduced——
Production run—2007–
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
Family—Applied Materials UVision 3
Specifications
Type—DUV Brightfield wafer inspection tool[1]
Throughput improvement—40% faster than any competitive brightfield inspection tool[1]
Defect sensitivity—20 nm[1]
Laser architecture—Multi-beam DUV laser (triples the number of laser beams)[1]
Imaging modes—Two new imaging modes extending sensitivity to 20 nm[1]
Defect classification—Flexible automatic defect classification engine[1]
Sources (1)Every fact above is drawn from these public sources
  1. [1]nanotech-now.comnanotech-now.com