Waferpedia

Comparison ledger

G10-SiCversus0020 18698 Part

Aixtron G10-SiC, Applied Materials 0020 18698 Part, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
G10-SiCAixtron
0020 18698 PartApplied Materials
OEMAixtronApplied Materials
CategoryDepositionDeposition
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyAixtron G10-SiCApplied Materials 0020 18698 Part
Specifications
Model designationG10-SiC[1]—
Equipment typeCVD (chemical vapor deposition) system for SiC[1]—
Configuration—Dial Cover, Side Local Match, Hdpcvd, Ul[2]

Plan your fab

Building a Deposition process? Get a complete equipment list.

Open the fab equipment planner →
Sources (2)Every fact above is drawn from these public sources
  1. [1]aixtron.comaixtron.com
  2. [2]inventory listing