Comparison ledger
ABM -407B-2-S-CE-S293 Robot, Hitachi Z-5010, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Z-5010Hitachi | |
|---|---|---|
| OEM | ABM | Hitachi |
| Category | — | — |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | ABM -407B-2-S-CE-S293 Robot | Hitachi Z-5010 |
| Specifications | ||
| Model | ABM-407B-2-S-CE-S293[1] | — |
| Description | ROBOT[1] | — |
| Refurbished RTP RTA | AG Associates 4100, 4108, 8108, 8800, 8800i,210, 310, 410, 610, 610I, MPT RTP-600S, 800S, RTP-3000[1] | — |
| KLA-Tencor Spare Parts and Service | RS-35C,RS-55,RS-75,RS-100,UV-1050,UV-1080,UV-1250,UV-1280,ASET F5 / F5X,AIT Systems,HRP-220 Stylus Profiler[1] | — |
| Refurbished Isotropic Plasma Etcher | Matrix, Tegal, Lam Research, Branson/IPC, PlasmaTherm[1] | — |
| Refurbished PECVD, ALD Equipment | Cambridge, Oxford PlasmaLab , Plasma-Therm, STS/SPTS, AMAT[1] | — |
| Refurbished Mask Aligner | Canon Neutronix PLA501/545, Suss MA200CC, MA8BA8 GEN3, MA8BA8 GEN2, MA8BA8, MA200E[1] | — |
| Refurbished Bonding | SUSS SB6E, SUSS SB8E, EVG 620 BA, EVG EV501, West Bond 7200AR 7400A[1] | — |
| Refurbished Wafer Prober | Electroglas EG 4090u+, EG 4090, EG 2001X, EG 1034X, Cascade PS-21[1] | — |
| Insp | — | spectrophotometer/Zeeman[2] |
| Light Source | — | Hollow cathode lamp (hollow cathode lamp)[3] |
| Optical System | — | Polarized Zeeman correction (DC magnetic field)[3] |
| Spectrometer | — | Czerny-Turner mount[3] |
| Detector | — | Photomultiplier tube[3] |
| Measurement Mode | — | Flame method[3] |
| Wavelength Range | — | 190-900 nm[4] |
| Resolution | — | 0.2 nm[4] |
| Dimensions (W x D x H) | — | 600 mm x 600 mm x 400 mm[4] |
| Weight | — | Approx. 40 kg[4] |
| Maximum Number of Elements | — | 6 elements[4] |
| Analysis Methods | — | Polarized Zeeman method, air-acetylene method, nitrous oxide method[4] |