Comparison ledger
YES 1000P, YES CV200 RFS, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1000PYES | CV200 RFSYES |
|---|---|---|
| OEM | YES | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | 50mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | 1998 Acquisition | — |
| Control system | — | — |
| Generation | — | — |
| Family | YES 1000P | YES CV200 RFS |
| Specifications | ||
| Model | 1000P[1] | — |
| System type | Plasma cleaning system[1] | — |
| Shelf configuration | Four 16 x 16 inch shelves[1] | — |
| Total capacity | 1024 square inches[1] | — |
| Control system | PLC driven with plain English real time process readout and diagnostics in the event of system abort[1] | — |
| Number of shelves | 4[1] | — |
| Shelf size | 16 x 16 inches[1] | — |
| Power | 1000 W[2] | — |
| Configuration | Parallel plate[2] | — |
| Operation modes | Active, RIE, Downstream[1] | — |
| Sample size range | From smallest semiconductor chip to large flat panels[1] | — |
| Process | — | Plasma strip / descum system[3] |
| Wafer size | — | 50 mm to 200 mm[3] |
| Power supply | — | Variable Power Supply from 150 W to 1250 W[3] |
| Resist removal rate | — | Up to 7000 angstroms per minute[3] |
| Temperature measurement | — | Real-time wafer temperature measurement[3] |
| Temperature control | — | Flexible temperature control[3] |
| Gas inputs | — | Multiple process gas inputs[3] |
| Design | — | Unique downstream protective design[3] |
| Wafer size range | — | 50 mm to 200 mm[3] |
| Power supply range | — | 150 W to 1250 W[3] |
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