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Comparison ledger

SOPHI 200 Ionversus160 XP Ion

Ulvac SOPHI 200 Ion, Varian 160 XP Ion, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
OEMUlvacVarian
CategoryIon ImplantationIon Implantation
Wafer size——
Process node——
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyUlvac SOPHI 200 IonVarian 160 XP Ion
Specifications
Dose range (actual dose1010~1014 ions/cm2)[1]—
Beam current (~500μA) - Throughputmore than 100 pieces/h (6in)[1]—
Configuration—150mm High Current IMP[2]

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Sources (2)Every fact above is drawn from these public sources
  1. [1]inventory listing
  2. [2]waferpedia.comwaferpedia.com