Comparison ledger
Tokyo Electron Clean Track Lithius Resist, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Clean Track Lithius ResistTokyo Electron | 1000PYES |
|---|---|---|
| OEM | Tokyo Electron | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Tokyo Electron Clean Track | YES 1000P |
| Cited variants | — | |
| Specifications | ||
| Configuration | Single Block[1] | Parallel plate[5] |
| Make | Tel[1] | — |
| Model | Clean Track Lithius[1] | 1000P[4] |
| Wafer size | 12 inch[1] | — |
| Product type | Resist Coater / Developer[1] | — |
| OEM | Tokyo Electron[1] | — |
| Equipment type | Resist Coater / Developer[1] | — |
| System type | — | Plasma cleaning system[4] |
| Shelf configuration | — | Four 16 x 16 inch shelves[4] |
| Total capacity | — | 1024 square inches[4] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[4] |
| Number of shelves | — | 4[4] |
| Shelf size | — | 16 x 16 inches[4] |
| Power | — | 1000 W[5] |
| Operation modes | — | Active, RIE, Downstream[4] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[4] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →