Waferpedia

Comparison ledger

1512eversus983

Tegal 1512e, Tegal 983, side by side. Every value shown is drawn from the cited encyclopedia entries.

Side-by-side comparison of selected equipment models
Attribute
1512eTegal
983Tegal
OEMTegalTegal
CategoryEtchEtch
Wafer size—125mm
Process node—down to 0.5 micron
Introduced——
Production run——
Lifecycle——
Lifecycle milestones——
Control system——
Generation——
FamilyTegal 1512eTegal 983
Specifications
Tool typeIndustrial RIE plasma etcher system[1]—
Stated configurationWith modules assembly for CI-4222[1]—
Model—983[2]
Product name—983 ACS[2]
Category—Diode plasma etch tool[3]
Fixed electrode gap—6 mm[3]
Round substrate size—125 mm to 150 mm round silicon and GaAs substrates[3]
Rectangular substrate size—125 mm to 150 mm on a side[3]
Best-suited design rules—down to 0.5 micron[3]

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Sources (3)Every fact above is drawn from these public sources
  1. [1]semistarcorp.comsemistarcorp.com
  2. [2]web.archive.orgweb.archive.org
  3. [3]web.archive.orgweb.archive.org