Comparison ledger
Semitool ST 2700 Dual Stack Spin Rinse, YES 1000P, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ST 2700 Dual Stack Spin RinseSemitool | 1000PYES |
|---|---|---|
| OEM | Semitool | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | 1998 Acquisition |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool ST 2700 Dual Stack Spin Rinse | YES 1000P |
| Specifications | ||
| Model | — | 1000P[1] |
| System type | — | Plasma cleaning system[1] |
| Shelf configuration | — | Four 16 x 16 inch shelves[1] |
| Total capacity | — | 1024 square inches[1] |
| Control system | — | PLC driven with plain English real time process readout and diagnostics in the event of system abort[1] |
| Number of shelves | — | 4[1] |
| Shelf size | — | 16 x 16 inches[1] |
| Power | — | 1000 W[2] |
| Configuration | — | Parallel plate[2] |
| Operation modes | — | Active, RIE, Downstream[1] |
| Sample size range | — | From smallest semiconductor chip to large flat panels[1] |
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