Comparison ledger
Semitool 11600 SRD, YES R3, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | R3YES |
|---|---|---|
| OEM | Semitool | YES |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool 11600 SRD | YES R3 |
| Specifications | ||
| Configuration | Ceramic[1] | — |
| Manufacturer | Semitool[1] | — |
| Model | 11600 SRD[1] | — |
| Equipment type | Spin Rinse Dryer[1] | Plasma cleaning system[4] |
| System type | — | Plasma cleaner / plasma cleaning system[2] |
| Control | — | Sequential microprocessor[2] |
| Program storage | — | Up to 90 separate one- or two-gas programs in memory[2] |
| Power supply | — | 500 Watt[2] |
| Plasma gas inputs | — | Two standard; optional third input[2] |
| Backfill input | — | Standard[2] |
| Electrode sets | — | Two 12-inch square electrode sets standard[2] |
| Sample tray capacity | — | Two 12 x 12 in. sample trays; total capacity 325 sq.in.[2] |
| Sample trays | — | Two 12 x 12 in.; total capacity 325 sq.in.[2] |
| Controller | — | Sequential microprocessor; up to 90 stored one- or two-gas programs[2] |
| Process gas and modes (UC Santa Barbara configuration) | — | Oxygen; downstream and direct plasma cleaning[3] |
| Position in series | — | Smallest of the series; pilot run quantities[2] |
| Control system | — | Sequential microprocessor[2] |
| Stored programs | — | Up to 90 separate one- or two-gas programs[2] |
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