Comparison ledger
Semitool 11600 SRD, Semitool 421 Spray Solvent, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 11600 SRDSemitool | 421 Spray SolventSemitool |
|---|---|---|
| OEM | Semitool | Semitool |
| Category | Wet Processing / Clean | Wet Processing / Clean |
| Wafer size | — | Batch Solvent Processor for Wafer Cleaning |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Semitool 11600 SRD | Semitool 421 |
| Cited variants | — |
|
| Specifications | ||
| Configuration | Ceramic[2] | Single Chamber[3] |
| Manufacturer | Semitool[2] | — |
| Model | 11600 SRD[2] | — |
| Equipment type | Spin Rinse Dryer[2] | — |
| Process Applications | — | Polymer Removal, Resist Stripping, Wafer Cleaning, Metal Lift-Off[3] |
| Wafer size | — | Batch Solvent Processor for Wafer Cleaning[3] |
| Max Wafer Size | — | 8"/200mm Wafers[3] |
| Chamber Type | — | Single Chamber[3] |
| Number of Tanks | — | 4[3] |
| Heated Tanks | — | 2[3] |
| Ambient Tanks | — | 2[3] |
| Rotor Included | — | 1[3] |
| Max Wafers per Batch | — | 50 wafers[4] |
| Vintage | — | 2004[3] |
| Wafer Size | — | 200 mm[1] |
Plan your fab
Building a Wet Processing / Clean process? Get a complete equipment list.
Open the fab equipment planner →