Comparison ledger
Plasma-Therm Unaxis 790 RIE, Tegal 1512e, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Unaxis 790 RIEPlasma-Therm | 1512eTegal |
|---|---|---|
| OEM | Plasma-Therm | Tegal |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Plasma-Therm Unaxis 790 | Tegal 1512e |
| Specifications | ||
| Configuration | Gases:[1] | — |
| Wafer size | 6 inch[1] | — |
| Process gases | SF6, CHF3, CF4, O2, He, Ar, N2[1] | — |
| RF source frequency | 13.56 MHz[1] | — |
| Tool type | Reactive Ion Etcher (RIE)[1] | Industrial RIE plasma etcher system[2] |
| Stated configuration | — | With modules assembly for CI-4222[2] |
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