Comparison ledger
Oxford Instruments 100 ICP Fluorine, Semitool Scepter SCE A 311, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 100 ICP FluorineOxford Instruments | Scepter SCE A 311Semitool |
|---|---|---|
| OEM | Oxford Instruments | Semitool |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Oxford Instruments 100 ICP Fluorine | Semitool Scepter SCE A 311 |
| Specifications | ||
| Etch Gases | SF6, CF4, O2, Ar, N2, CHF3, C4F8[1] | — |
| Cryo DRIE etch rate | up to 5 µm/min[1] | — |
| Wafer size | 4 inch, 6 inch, 8 inch (with clamp change)[1] | 8 inch[2] |
| OEM | — | Semitool[2] |
| Model | — | Scepter SCE A 311[2] |
| Equipment type | — | Wet Etcher[2] |
| Description | — | Wet Etcher – Acid Spray[3] |
| Version | — | 200mm[3] |
| Vintage | — | 2001[2] |
| Date of manufacture | — | 2001[4] |
| Software revision | — | SAAB 3.1[4] |
| Serial number | — | G191108[4] |
| Location | — | Nijmegen[4] |
| Condition | — | As Is[4] |
| Wafer Size | — | 200 mm (8 inch)[2] |
| Process Type | — | Wet Etcher – Acid Spray[3] |
| Vintage (Year of Manufacture) | — | 2001[2] |
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