Comparison ledger
Nikon 1505 G 6 E, Nikon NSR SF 100 i-Line, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | 1505 G 6 ENikon | NSR SF 100 i-LineNikon |
|---|---|---|
| OEM | Nikon | Nikon |
| Category | Lithography | Lithography |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | 1988– | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Nikon 1505 | Nikon NSR |
| Specifications | ||
| Configuration | 5" reticle[1] | 6" reticle[4] |
| Resolution | 650 nm[2] | 0.4um or less[4] |
| Numerical Aperture | 0.54[2] | — |
| Reduction | 5x[2] | — |
| Exposure Field | 15 x 15 mm[2] | — |
| Alignment Accuracy | 130 nm[2] | — |
| Wafer Size | 4 inch[1] | — |
| Light Source | g-line[3] | — |
| Introduction Year | 1988[2] | — |
| NA (Numerical Aperture) | 0.54[2] | — |
| Make | Nikon[1] | — |
| Model | 1505 G 6 E[1] | — |
| Category | Stepper[1] | — |
| Wafer Sizes | 4 inch[1] | — |
| Exposure type | g-line[2] | — |
| NA | 0.54[2] | — |
| Exposure field | 9.3 x 18.8 mm[2] | 25 x 33 mm[5] |
| N.A. | — | 0.5[4] |
| Exposed light source | — | i-line (wavelength = 365nm)[4] |
| Exposure range | — | 25x33mm[4] |
| Alignment accuracy | — | 45nm or less (M + 3 sigma)[4] |
| Throughput | — | 120 wafers / hour (200mm wafer), 80 wafers / hour (300mm wafer, approximately)[4] |
| Reduction ratio | — | 1:4[5] |
| Throughput (200 mm wafer) | — | 120 wafers/hour or more[5] |
| 300 mm configuration | — | Field-upgradable to a fully compliant 300 mm configuration[5] |
| Numerical aperture (N.A.) | — | 0.5[4] |
| Wafer sizes | — | 8 inch[4] |
| Throughput (300 mm wafer) | — | 80 wafers/hour (approximately)[4] |
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