Comparison ledger
Laurell EDC-HL-15 B, Laurell WS-650-15 B, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EDC-HL-15 BLaurell | WS-650-15 BLaurell |
|---|---|---|
| OEM | Laurell | Laurell |
| Category | Resist Processing | Resist Processing |
| Wafer size | 300mm | 300mm |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Laurell EDC-HL-15 B | Laurell WS-650-15 B |
| Specifications | ||
| OEM | Laurell[1] | Laurell[2] |
| Model | EDC-HL-15 B[1] | WS-650-15 B[2] |
| Type | EDC™ System[1] | Spin Coater[1] |
| Controller | 650-series[1] | 650-series[1] |
| Max. substrate size | 300mm (9" x 9")[1] | — |
| Max. RPM | 12000 rpm[1] | — |
| Mounting options | Tabletop, In-Deck, On-deck[1] | — |
| Max Substrate Size | — | ø 300mm (9" × 9")[1] |
| Max RPM | — | 12000 rpm[1] |
| Mounting Options | — | Tabletop, In-Deck, On-Deck[1] |
| Series | — | 650-series[2] |
| Max substrate size | — | ø 300mm wafers and 9" × 9" (229mm × 229mm) substrates[2] |
| Category | — | Spin Coater[1] |
| Processes supported | — | Coating, Etching, Developing, Rinsing-Drying and Cleaning[2] |
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