Comparison ledger
Lam Research Kiyo 45, Oxford Instruments 100 ICP Fluorine, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | Kiyo 45Lam Research | 100 ICP FluorineOxford Instruments |
|---|---|---|
| OEM | Lam Research | Oxford Instruments |
| Category | Etch | Etch |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Lam Research Kiyo | Oxford Instruments 100 ICP Fluorine |
| Specifications | ||
| Configuration | 2 Chamber + 1 Strip[1] | — |
| Loadport | Brooks 799-701175-005[1] | — |
| ATM Robot | Brooks P/N 138150[1] | — |
| TM Robot | Brooks P/N 201600-01[1] | — |
| MKS E28B-30200 Process Vacuum Gauge | 0.1 Torr[1] | — |
| MKS 625A-14059 Chamber Vacuum Gauge | 1 Torr[1] | — |
| MKS D24B12TCECB0 Micro Wave Vacuum Gauge | 100 Tor[1] | — |
| Chamber configuration | 2 Chamber + 1 Strip[1] | — |
| Process Vacuum Gauge | MKS E28B-30200, 0.1 Torr[1] | — |
| Chamber Vacuum Gauge | MKS 625A-14059, 1 Torr[1] | — |
| Micro Wave Vacuum Gauge | MKS D24B12TCECB0, 100 Torr[1] | — |
| Air Lock Heating Gauge | Teledyne HPM-2002-OBE-LM[1] | — |
| Turbo Pump | Edwards SCU 1500[1] | — |
| Turbo Pump Controller | Edwards SCU 1600[1] | — |
| Bias RF Generator | Lam 3156110-214[1] | — |
| TCP RF Generator | Lam 3156110-313[1] | — |
| Etch Gases | — | SF6, CF4, O2, Ar, N2, CHF3, C4F8[2] |
| Cryo DRIE etch rate | — | up to 5 µm/min[2] |
| Wafer size | — | 4 inch, 6 inch, 8 inch (with clamp change)[2] |
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