Comparison ledger
KLA .496 PSL Wafer, Malvern Panalytical Empyrean, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | EmpyreanMalvern Panalytical | |
|---|---|---|
| OEM | KLA | Malvern Panalytical |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | Malvern Panalytical Empyrean |
| Specifications | ||
| Configuration | NIST Traceable[1] | — |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Voltage | — | 230 V[3] |
| Frequency | — | 60 Hz[3] |
| Power | — | 8 kVa[3] |
| Max. Current | — | 38 A rms[3] |
| X-ray generator maximum power | — | 4 kW (max 60 kV, max 100 mA)[4] |
| Goniometer reproducibility | — | ≤±0.0001°[4] |
| 2θ linearity | — | ±0.01°[4] |
| Maximum goniometer speed | — | 15 deg/s[4] |
| Resolution (FWHM on LaB₆) | — | 0.026°[4] |
| Dimensions (W x D x H) | — | 1400 × 1162 × 1947 mm[4] |
| Weight | — | 1150 kg[4] |
| Power supply | — | Single phase 210–230 V (±10% grid variations), 50/60 Hz[4] |
| Power consumption | — | Max. 4.6 kVA without controllers for optional equipment[4] |
| External cooling water supply | — | 4–6 liters/min, pressure up to 8 bar, temperature 15 to 35 °C[4] |
| Compressed air supply | — | 2–5 bar (0.2–0.5 MPa)[4] |
| Radiation level | — | Less than 1 microSievert per hour at 10 cm distance (Mo source @ 60 kV, 50 mA)[4] |
| Detector types | — | PIXcel1D, PIXcel3D, GaliPIX3D; also 1Der, point detectors (proportional counter, scintillation detector)[4] |
| Capabilities | — | X-ray diffraction (XRD), small- and wide-angle X-ray scattering (SAXS/WAXS), X-ray reflectivity, X-ray absorption spectroscopy (XAS), grazing incidence XRD, pair distribution function, texture mapping, residual stress measurement, computed tomography[4] |
| Source wavelengths | — | Cu Kα₁; also Mo radiation[5] |
| Temperature range for in situ stages | — | -200 °C to 1100 °C[6] |
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