Comparison ledger
KLA .496 PSL Wafer, KLA Profilm 3 D Optical, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | ||
|---|---|---|
| OEM | KLA | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | KLA .496 PSL Wafer | KLA Profilm |
| Specifications | ||
| Configuration | NIST Traceable[1] | OBJ-10X-Mirau 10x Nikon Mirau interferometric objective lens[3] |
| Wafer size | 8 inch[1] | — |
| Traceability | NIST Traceable[1] | — |
| Compatible systems | Capable on Surfscan 6xy0 and SP1[1] | — |
| Category | Metrology & Inspection[2] | — |
| Measurement principle | — | Vertical Scanning Interferometry (VSI) and Phase-Shifting Interferometry (PSI)[4] |
| Thickness range (VSI) | — | 50 nm – 100 mm[4] |
| Thickness range (PSI) | — | 0 – 3 µm[4] |
| Reflectance range | — | 0.05% – 100%[4] |
| Piezo scan range | — | 500 µm[4] |
| XY stage options | — | 100 mm × 100 mm or 200 mm × 200 mm[4] |
| Objectives | — | 5X, 10X, 20X, 50X, 100X[5] |
| Sample max width | — | 265 mm (Profilm3D); 365 mm (Profilm3D-200)[5] |
| System weight | — | 15 kg (Profilm3D); 22 kg (Profilm3D-200)[5] |
| Model configuration | — | OBJ-10X-Mirau 10x Nikon Mirau interferometric objective lens; WSProfilm3D-200 manual rotating (r-theta) stage for 200mm wafers; Profilm-AnalysisSoftware permanent license; UPG-PSI upgrade; Accurion Nano30 active vibration isolation system; stitching not included[3] |
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