Comparison ledger
Hitachi NB 5000 Dual Beam FIB-SEM, KLA .498 PSL Wafer, side by side. Every value shown is drawn from the cited encyclopedia entries.
| Attribute | NB 5000 Dual Beam FIB-SEMHitachi | |
|---|---|---|
| OEM | Hitachi | KLA |
| Category | Metrology & Inspection | Metrology & Inspection |
| Wafer size | — | — |
| Process node | — | — |
| Introduced | — | — |
| Production run | — | — |
| Lifecycle | — | — |
| Lifecycle milestones | — | — |
| Control system | — | — |
| Generation | — | — |
| Family | Hitachi NB 5000 Dual Beam FIB-SEM | KLA .498 PSL Wafer |
| Specifications | ||
| Configuration | Premium System[1] | NIST Traceable[3] |
| Power | 8kVA[2] | — |
| Frequency | 50/60 Hz[2] | — |
| Input voltage | 200 / 208 / 230 Vac[2] | — |
| SEM resolution | 1.0nm @ 15Kv[1] | — |
| FIB resolution | 5nm @ 40Kv[1] | — |
| FIB column beam range | 1Kv - 40Kv[1] | — |
| FIB column beam current | >50nA max beam current (operable)[1] | — |
| SEM column beam range | 0.5Kv - 30Kv[1] | — |
| SEM electron gun | ZrO/W Schottky emission electron gun[1] | — |
| SEM column beam current | >30nA max beam current[1] | — |
| Pattern generator | 4K X 4K Pattern Generator System[1] | — |
| Image memory | 2560 X 1920[1] | — |
| Display | Dual Monitor Simultaneous Display[1] | — |
| Vacuum system | Turbo Molecular Pump; Dry Pump (250 I/s @60hz); Ion source chamber Ion pump (20 I/s); Getter Pump (100 l/s); Electron gun chamber Ion pump (30 l/s); Intermediate chamber Ion pump (30 l/s)[1] | — |
| NIST traceability | — | Yes[3] |
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